1. Overview
The WS-650 MZ-23NPPB is a programmable spin coater designed for uniform thin-film deposition from small liquid volumes. It offers precise control of speed, acceleration, and spin time for producing coatings of photoresists, sol–gel solutions, polymers, nanoparticles, biomaterials, and other functional liquids.
Features
- Spin speed: up to 12,000 rpm (depending on substrate size)
- Substrate capacity: up to 200 mm diameter wafer
- Acceleration control
User Notes
- Substrate should be clean and dry for uniform film formation.
- Solution viscosity and ambient conditions (temperature, humidity) affect coating uniformity.
- Vacuum chuck size should match substrate diameter for stable spinning.
- Multi-step spin programs can be used for layered coatings or gradient films.
2. Principle
A controlled volume of solution is dispensed onto a substrate mounted on the vacuum chuck.
The substrate rotates at high speed, and centrifugal force spreads the liquid into a thin, uniform film.
Film thickness depends on viscosity, spin speed, acceleration, and time, allowing reproducible nanoscale or microscale coatings.
3. Data Interpretation
- Film thickness uniformity reflects spin speed stability and solution rheology
- Thickness vs. speed curves allow predictable coating control
- Defects (striations, pinholes, “comet tails”) can indicate impurities, viscosity variations, or poor substrate cleaning
- Final substrate quality can be evaluated using ellipsometry, profilometry, SEM, AFM, or optical microscopy
4. Example Applications
- Photoresist coating for microfabrication or lithography
- Polymer thin-film preparation for optical or electrical testing
- Sol–gel coatings for oxide films or dielectric layers
- Perovskite or organic semiconductor film casting
- Biomaterial coatings on silicon, glass, or metal substrates
- Nanoparticle or quantum-dot thin-film deposition